Extreme ultraviolet (EUV) exposure system and method of manufacturing semiconductor device using the same
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United States of America Patent
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Jun 12, 2018
Issued Date -
Feb 1, 2018
app pub date -
Mar 21, 2017
filing date -
Jul 27, 2016
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Abstract
An extreme ultraviolet (EUV) exposure system capable of improving the yield of an EUV exposure process by improving EUV exposure performance, and furthermore, capable of increasing throughput or productivity of the EUV exposure process, the EUV exposure system including an EUV exposure apparatus configured to perform EUV exposure on a wafer disposed on a chuck table, a load-lock chamber combined with the EUV exposure apparatus and configured to supply and discharge the wafer to/from the EUV exposure apparatus, and an ultraviolet (UV) exposure apparatus configured to perform UV exposure by irradiating an entire upper surface of the wafer with a UV light without using a mask.
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