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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
SUMITOMO CHEMICAL COMPANY LIMITED	2-7-1 NIHONBASHI CHUO-KU TOKYO 103-6020

International Classification(s)

• C08G:MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN B....
• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Ichikawa, Koji	Osaka, JP	316	1995
Sakamoto, Hiromu	Osaka, JP	24	205

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
3.5 Year Payment	$1600.00	$800.00	$400.00	Mar 14, 2025
7.5 Year Payment	$3600.00	$1800.00	$900.00	Mar 14, 2029
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Mar 14, 2033

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 3.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 7.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
September 14, 2021	US,11119408,B2   US11119408B2	GRANTED PATENT AS SECOND PUBLICATION
February 01, 2018	US,20180031969,A1   US20180031969A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent Application No: 2018/0031,969

COMPOUND, RESIN AND PHOTORESIST COMPOSITION

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