Photoacid generator and photoresist composition including the same

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United States of America Patent

PATENT NO 11009790
APP PUB NO 20180031967A1
SERIAL NO

15662677

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Abstract

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A photoacid generator (PAG) and a photoresist composition, the PAG being represented by the following Chemical Formula (I):

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTD129 SAMSUNG-RO YEONGTONG-GU SUWON-SI GYEONGGI-DO 16677 16677

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cho, Kyoung-yong Namyangju-si, KR 3 22
Hong, Suk-koo Yongin-si, KR 7 6
Jeon, Gum-hye Hwaseong-si, KR 3 3
Kang, Mi-yeong Incheon, KR 1 3
Lee, Hyo-sung Hwaseong-si, KR 20 94
Park, Gun-woo Seoul, KR 3 7

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Patent Citation Ranking

  • 2 Citation Count
  • C07D Class
  • 71.40 % this patent is cited more than
  • 4 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges4964194839101 - 1011 - 2021 - 300250500750100012501500175020002250250027503000325035003750400042504500475050005250

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