MANUFACTURE METHOD OF QUANTUM DOT COLOR FILM SUBSTRATE

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United States of America Patent

SERIAL NO

14914645

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Abstract

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The disclosure provides a manufacture method of a quantum dot color film substrate, a high precision quantum dot pattern is formed utilizing a property of moisture varied layer of a photocatalyst achieving better moisture after being radiated by ultraviolet light, manufacture process of a quantum dot pattern is simplified as well as enhancing precision of quantum dot layer pattern, and consuming less quantum dot materials and costs, produced quantum dot color film substrate can improve color saturation and gamut of a display device efficiently, reinforcing color display ability of a display panel

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Patent Owner(s)

Patent OwnerAddress
SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTDNO 9-2 TANGMING RD GUANGMING NEW DISTRICT SHENZHEN GUANGDONG 518132

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Liu, Guohe Shenzhen City, CN 12 47

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Patent Citation Ranking

  • 8 Citation Count
  • G02F Class
  • 24.26 % this patent is cited more than
  • 7 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges6081671150421334412801 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7081 - 9091 - 100100 +0100200300400500600700800900100011001200130014001500160017001800

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