MANUFACTURE METHOD OF QUANTUM DOT COLOR FILM SUBSTRATE

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United States of America Patent

SERIAL NO

14914645

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The disclosure provides a manufacture method of a quantum dot color film substrate, a high precision quantum dot pattern is formed utilizing a property of moisture varied layer of a photocatalyst achieving better moisture after being radiated by ultraviolet light, manufacture process of a quantum dot pattern is simplified as well as enhancing precision of quantum dot layer pattern, and consuming less quantum dot materials and costs, produced quantum dot color film substrate can improve color saturation and gamut of a display device efficiently, reinforcing color display ability of a display panel

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Patent Owner(s)

Patent OwnerAddress
SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTDNO 9-2 TANGMING ROAD GUANGMING DISTRICT SHENZHEN GUANGDONG 518132

International Classification(s)

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  • 2015 Application Filing Year
  • G02F Class
  • 4586 Applications Filed
  • 3732 Patents Issued To-Date
  • 81.38 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances2015201620172018201920202021202220230255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Liu, Guohe Shenzhen City, CN 12 47

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Patent Citation Ranking

  • 8 Citation Count
  • G02F Class
  • 24.26 % this patent is cited more than
  • 7 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges6081671150421334412801 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7081 - 9091 - 100100 +0100200300400500600700800900100011001200130014001500160017001800

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