Method for manufacturing a germanium slow light waveguide and photodiode incorporating this slow light waveguide

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United States of America Patent

PATENT NO 10132998
APP PUB NO 20180031765A1
SERIAL NO

15660183

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Abstract

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This method for manufacturing a germanium slow light waveguide includes:

    producing, in a silicon plate, a cavity the cross section of which, parallel to the plane of the plate, is identical to the horizontal cross section of the slow light waveguide and the bottom of which is located inside the silicon plate; thencarrying out an operation of vapor phase epitaxial growth of germanium on the bottom of the cavity until this cavity is completely filled with germanium; andbefore implementing said epitaxial growth operation, a protective layer is deposited on an upper face of the silicon plate or, after implementing said epitaxial growth operation, the germanium that has grown on said upper face is removed.

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Patent Owner(s)

Patent OwnerAddress
COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVESFRANCE PARIS PARIS

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fowler, Daivid Saint Martin le Vinoux, FR 15 9
Hassan, Karim Moneteau, FR 31 90
Kopp, Christophe Fontanil-Cornillon, FR 27 173
Szelag, Bertrand Herbeys, FR 15 31

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