A METHOD OF STABILIZING A SUBSTRATE AND A MACHINE FOR PERFORMING THE METHOD
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United States of America Patent
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Feb 17, 2016
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Feb 19, 2015
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A method of treating a substrate 23 includes a doping step followed immediately by a stabilization step. The method is remarkable in that the stabilization step involves immersing the substrate in a gas forming part of the set consisting of: oxygen; water vapor; wet air; hydrogen peroxide vapor; ozone; and ammonia. Also disclosed is a machine for treating a substrate in accordance with the above method and including a gas introduction orifice.
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