Source supplier for a supercritical fluid, substrate processing apparatus having the same
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United States of America Patent
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Jun 2, 2020
Grant Date -
Feb 1, 2018
app pub date -
Apr 7, 2017
filing date -
Jul 29, 2016
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Abstract
A source supplier includes a source reservoir that contains a liquefied source fluid for a supercritical process, a vaporizer that vaporizes the liquefied source fluid into a gaseous source fluid under high pressure, a purifier that removes organic impurities and moistures from the gaseous source fluid and an analyzer connected to the purifier that analyzes an impurity fraction and a moisture fraction in the gaseous source fluid. Moisture and organic impurities are removed from the source fluid to reduce the moisture concentration of the supercritical fluid in the supercritical process.
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