Source supplier for a supercritical fluid, substrate processing apparatus having the same
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United States of America Patent
Stats
-
Jun 2, 2020
Grant Date -
Feb 1, 2018
app pub date -
Apr 7, 2017
filing date -
Jul 29, 2016
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A source supplier includes a source reservoir that contains a liquefied source fluid for a supercritical process, a vaporizer that vaporizes the liquefied source fluid into a gaseous source fluid under high pressure, a purifier that removes organic impurities and moistures from the gaseous source fluid and an analyzer connected to the purifier that analyzes an impurity fraction and a moisture fraction in the gaseous source fluid. Moisture and organic impurities are removed from the source fluid to reduce the moisture concentration of the supercritical fluid in the supercritical process.
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International Classification(s)
- 2017 Application Filing Year
- H01L Class
- 30754 Applications Filed
- 25260 Patents Issued To-Date
- 82.14 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- H01L Class
- 0 % this patent is cited more than
- 5 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Dec 2, 2027 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Dec 2, 2031 |
