Apparatus for and method of source material delivery in a laser produced plasma EUV light source
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United States of America Patent
Stats
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Mar 19, 2019
Grant Date -
Jan 25, 2018
app pub date -
Sep 6, 2017
filing date -
Dec 2, 2013
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A device and method are disclosed in which a source material delivery system can be reoriented so that the path of the source material is not directly towards an irradiation region in operating conditions in which the path is expected to be unpredictable. A shroud provided to protect the flow of source material from being disrupted is segmented so with one part of the shroud being movable with respect to another part of the shroud so that the movable part can avoid interfering with the path of the source material when it is not directly towards the irradiation region.
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International Classification(s)
- 2017 Application Filing Year
- H05G Class
- 181 Applications Filed
- 137 Patents Issued To-Date
- 75.70 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- H05G Class
- 0 % this patent is cited more than
- 6 Age
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| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Sep 19, 2026 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Sep 19, 2030 |
