Vapor deposition mask, frame-equipped vapor deposition mask, and method for producing organic semiconductor element
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United States of America Patent
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Jul 16, 2019
Grant Date -
Jan 25, 2018
app pub date -
Sep 29, 2017
filing date -
Nov 14, 2013
priority date (Note) -
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Abstract
A vapor deposition mask includes a metal mask and a resin mask having an opening. An inner wall surface for composing the opening has an inflection point in a thicknesswise cross section of the resin mask. When an intersection of a first surface, not facing the metal mask, of the resin mask and the inner wall surface is set to be a first intersection, an intersection of a second surface, facing the metal mask, of the resin mask and the inner wall surface is set to be a second intersection, and there is set a first inflection point first positioned from the first intersection toward the second intersection, an angle formed by a line connecting the first intersection and the first inflection point and the first surface is larger than an angle formed by a line connecting the first inflection point and the second intersection and the second surface.
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