Substrate liquid processing apparatus, substrate liquid processing method, and storage medium

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United States of America Patent

PATENT NO 10483137
APP PUB NO 20180025927A1
SERIAL NO

15649757

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Abstract

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The substrate liquid processing apparatus includes a processing bath that accommodates substrates, and a plurality of gas supply pipes provided in a processing bath. Ejection holes of one gas supply pipe and ejection holes of another adjacent gas supply pipe do not overlap each other in a direction parallel to the circuit-formed surfaces of the substrates.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Masutomi, Hiroyuki Kumamoto, JP 6 21
Satoh, Takami Kumamoto, JP 21 284
Shiokawa, Toshiyuki Kumamoto, JP 6 24
Tanaka, Koji Kumamoto, JP 376 3502

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