SUBSTRATE PROCESSING APPARATUS
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United States of America Patent
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Issued Date -
Jan 25, 2018
app pub date -
Jul 14, 2017
filing date -
Jul 19, 2016
priority date (Note) -
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Abstract
A substrate processing apparatus includes an outer tube including an open bottom portion and a closed top portion, and an inner tube disposed in the outer tube and spaced apart from the outer tube. The inner tube includes a first opening at a top portion of the inner tube, a second opening at a bottom portion of the inner tube, and an inner sidewall including a plurality of exhaust holes on one side of the inner sidewall, the inner sidewall defining the first and second openings.
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