METHODS FOR HIGH TEMPERATURE ETCHING A MATERIAL LAYER USING PROTECTION COATING

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United States of America Patent

APP PUB NO 20180025914A1
SERIAL NO

15216948

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Abstract

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Methods for etching a bottom anti-reflective coating (BARC) and/or an anti-reflective coating (ARC) and/or a dielectric anti-reflective coating (DARC) to form high aspect ratio features using an etch process are provided. The methods described herein advantageously facilitate profile and dimension control of features with high aspect ratios through a proper sidewall and bottom management scheme during the bottom anti-reflective coating (BARC) and/or an anti-reflective coating (ARC) and/or a dielectric anti-reflective coating (DARC) open process. In one embodiment, a method for etching a dielectric anti-reflective coating (DARC) layer to form features in the DARC layer includes supplying an etching gas mixture onto a DARC layer disposed on a substrate, wherein the substrate is disposed on a substrate support pedestal assembly disposed in a processing chamber, controlling a temperature of the substrate support pedestal assembly greater than 110 degrees Celsius, and etching the DARC layer disposed on the substrate.

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Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS INC3050 BOWERS AVENUE SANTA CLARA CA 95054

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
JIANG, Shan Santa Clara, US 110 1913
KIM, Jonathan Santa Clara, US 32 973
LEE, Gene San Jose, US 55 545
MEHROTRA, Akhil Santa Clara, US 10 20
PATIL, Abhijit San Jose, US 22 85
ZHOU, Hailong San Jose, US 28 153

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