Precleaning apparatus and substrate processing system
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United States of America Patent
Stats
-
Sep 29, 2020
Grant Date -
Jan 25, 2018
app pub date -
Jan 26, 2017
filing date -
Jul 22, 2016
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A precleaning apparatus includes a chamber having an internal space in which a substrate is cleaned, a substrate support disposed in the chamber and configured to support the substrate, a plasma generation unit disposed in the chamber and configured to generate plasma gas, a heating unit configured to heat the substrate on the substrate support, a cleaning gas supply unit configured to supply gas for oxide etching to the internal space of the chamber, and a hydrogen gas supply unit configured to supply hydrogen gas to the internal space of the chamber.
First Claim
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International Classification(s)
- 2017 Application Filing Year
- H01J Class
- 2316 Applications Filed
- 1735 Patents Issued To-Date
- 74.92 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- H01J Class
- 0 % this patent is cited more than
- 5 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Mar 29, 2028 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Mar 29, 2032 |
