Piecewise alignment modeling method
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United States of America Patent
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Nov 20, 2018
Grant Date -
Jan 25, 2018
app pub date -
Jul 7, 2017
filing date -
Jul 19, 2016
priority date (Note) -
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status (Latency Note)
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Abstract
Embodiments disclosed herein generally relate to adjusting exposure parameters of a substrate in response to an overlay error. The method includes partitioning the substrate into one or more sections. Each section corresponds to an image projection system. A total overlay error of a first layer deposited on the substrate is determined. For each section, a sectional overlay error is calculated. For each overlap area, in which two or more sections overlap, an average overlay error is calculated. The exposure parameters are adjusted in response to the total overlay error.
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