Edge exposure apparatus
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United States of America Patent
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Sep 11, 2018
Grant Date -
Jan 25, 2018
app pub date -
Jan 28, 2015
filing date -
Jan 28, 2015
priority date (Note) -
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Abstract
An edge exposure apparatus for exposure of an outer circumferential portion of a semiconductor substrate to light includes a light source provided to be able to emit light to the outer circumferential portion and a mirror having a reflection surface arranged to extend in a direction intersecting with an optical axis of light emitted from the light source. The mirror is provided between the outer circumferential portion and a center of the semiconductor substrate in a radial direction of the semiconductor substrate in exposure of the outer circumferential portion of the semiconductor substrate to light.
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