Active eye-to-eye with alignment by X-Y capacitance measurement
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United States of America Patent
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Oct 30, 2018
Grant Date -
Jan 25, 2018
app pub date -
Jun 21, 2017
filing date -
Jul 22, 2016
priority date (Note) -
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Abstract
Embodiments of the present disclosure generally relate to systems and methods for performing photolithography processes. In one embodiment, a photolithography system includes a plurality of image projection systems each having an extendable lens, and a plate having a plurality of openings. Each extendable lens is configured to be extended through a corresponding opening of the plurality of openings during operation. The plate includes one or more elements disposed adjacent each opening and each lens includes one or more elements formed thereon. The one or more elements formed on the plate and the one or more elements formed on the lens are utilized to measure one or more distances between the lens and the plate. Any deviation of the measured distance from a reference distance indicates that the lens has been shifted. Measures to compensate for the shifting of the lens will be performed.
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