Resist composition and patterning process using the same
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United States of America Patent
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Nov 13, 2018
Grant Date -
Jan 25, 2018
app pub date -
Jun 27, 2017
filing date -
Jul 22, 2016
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Abstract
The present invention provides a resist composition containing a base resin composed of a polymer compound that contains a repeating unit “a” shown by formula (1) and a repeating unit “b” having either or both of a carboxyl group in which a hydrogen atom is substituted with an acid-labile group and a phenolic hydroxyl group in which a hydrogen atom is substituted with an acid-labile group, with a weight average molecular weight of 1,000 to 500,000. There can be provided a resist composition that has high sensitivity and high resolution, and can give a pattern with low dimensional variation and good pattern profile after exposure.
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