Method and an apparatus for performing a plasma chemical vapour deposition process and a method
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United States of America Patent
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Sep 8, 2020
Grant Date -
Jan 25, 2018
app pub date -
Oct 3, 2017
filing date -
Oct 4, 2016
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Abstract
A method and apparatus for performing a plasma chemical vapour deposition process including a mainly cylindrical resonator having an outer cylindrical wall and an inner coaxial cylindrical wall defining therebetween a resonant cavity operable at an operating frequency. The resonant cavity extends in a circumferential direction around a cylindrical axis of the inner and outer cylindrical wall. The outer cylindrical wall includes an input port connectable to an input waveguide. The inner cylindrical wall includes slit sections extending in a circumferential direction around the cylindrical axis. A greatest dimension defining the aperture of the slit sections is smaller than half the wavelength of the operating frequency.
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