Imprint apparatus, imprint method, and method of manufacturing article
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United States of America Patent
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Aug 25, 2020
Grant Date -
Jan 25, 2018
app pub date -
Mar 7, 2016
filing date -
Apr 14, 2015
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Abstract
The present invention an imprint apparatus which performs an imprint process of forming a pattern in an imprint material on a substrate using a mold, the apparatus including an image capturing unit configured to obtain an image by capturing the substrate, and a processing unit configured to perform detection processing of detecting a foreign particle present between the mold and the substrate, wherein the processing unit performs the detection processing by comparing, with a reference image, an image obtained by the image capturing unit in a state in which the mold and the imprint material on the substrate are in contact with each other, and when the image includes a region outside the substrate, the region outside the substrate is excluded from a target of the detection processing.
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