Retaining ring for CMP

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United States of America Patent

PATENT NO 10322492
APP PUB NO 20180021918A1
SERIAL NO

15658294

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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A retaining ring includes a generally annular body having an inner surface to constrain a substrate and a bottom surface, the bottom surface having a plurality of channels extending from an outer surface to the inner surface, and a plurality of islands separated by the channels and providing a contact area to contact a polishing pad, wherein the contact area is about 15-40% of a plan area of the bottom surface.

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Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS INC3050 BOWERS AVENUE SANTA CLARA CA 95054

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Diao, Jie Fremont, US 22 203
Iyer, Anand N Cupertino, US 22 124
Lee, Christopher Heung-Gyun San Jose, US 23 88
Lee, Wei-Cheng Los Altos Hills, US 24 173
Li, Thomas Santa Clara, US 44 639
Nagengast, Andrew J Sunnyvale, US 56 399
Oh, Jeonghoon Saratoga, US 138 872
Rondum, Erik S San Ramon, US 23 166
Zhang, Huanbo San Jose, US 32 76

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