COATING TREATMENT METHOD, COMPUTER STORAGE MEDIUM, AND COATING TREATMENT APPARATUS

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United States of America Patent

SERIAL NO

15549435

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Abstract

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A coating treatment method of applying a coating solution onto a substrate, includes: a solvent liquid film formation step of forming a first liquid film of a solvent at a middle portion of the substrate and forming a ring-shaped second liquid film having a film thickness larger than a film thickness of the first liquid film of the solvent at an outer peripheral portion of the substrate; a coating solution supply step of supplying the coating solution to a center portion of the substrate while rotating the substrate at a first rotation speed; and a coating solution diffusion step of diffusing the coating solution on the substrate by rotating the substrate at a second rotation speed higher than the first rotation speed while supplying the coating solution.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HASHIMOTO, Takafumi Koshi City, Kumamoto, JP 45 259
HATAKEYAMA, Shinichi Koshi City, Kumamoto, JP 21 86
SHIBATA, Naoki Koshi City, Kumamoto, JP 213 3274
YOSHIHARA, Kousuke Koshi City, Kumamoto, JP 113 1395

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