RF Attenuation Measurement System and Method
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United States of America Patent
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Feb 4, 2016
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Feb 4, 2015
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Abstract
In part, disclosure relates to a monitoring system for monitoring RF attenuation of a material. In one embodiment, the system includes a plurality of transmitting antennas; an RF generator having a first output terminal in electrical communication with each of the plurality of transmitting antennas and a second output terminal; a plurality of receiving antennas, each of the receiving antennas having an output terminal, and a processor having a first input terminal in electrical communication with the second output terminal of the RF generator, having a second input terminal in electrical communication with the output terminal of each of the plurality of receiving antennas, and having a first output in electrical communication with a display. In one embodiment, the processor calculates the attenuation of the RF signal in response to the RF signals received by the plurality of receiving antennas through the material.
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