Apparatus and associated method for battery charging
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
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Nov 26, 2019
Grant Date -
Jan 18, 2018
app pub date -
Jul 10, 2017
filing date -
Jul 12, 2016
priority date (Note) -
In Force
status (Latency Note)
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Abstract
An apparatus configured to,
- in respect of an electronic device comprising a battery for powering the electronic device and a charger configured to receive a mains power supply and, when connected to the electronic device, provide a power output to charge the battery, based on a determination of a failure of a request to increase the power output of the charger to the battery of the electronic device, the failure comprising where at least a requested increase of the power output of the charger by a first predetermined amount fails to yield an increase in the power output of the charger equal to the first predetermined amount within a threshold amount, provide an indication to the electronic device that the charger is disconnected from the mains power supply for causing the electronic device to indicate that the charger is disconnected from the mains power supply to a user of the electronic device.
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- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
NXP B V | 60 HIGH TECH PARK EINDHOVEN 5656 AG EINDHOVEN NORTH BRABANT PROVINCE |
International Classification(s)

- 2017 Application Filing Year
- H02J Class
- 5376 Applications Filed
- 3962 Patents Issued To-Date
- 73.70 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Degen, Peter Theodorus Johannes | Arnhem, NL | 17 | 45 |
# of filed Patents : 17 Total Citations : 45 | |||
Rooijackers, Cornelis Jozef Petrus Maria | Waalre, NL | 4 | 10 |
# of filed Patents : 4 Total Citations : 10 |
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- H02J Class
- 0 % this patent is cited more than
- 6 Age
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Fee | Large entity fee | small entity fee | micro entity fee | due date |
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7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | May 26, 2027 |
11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | May 26, 2031 |
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Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
Full Text
US Patent Application No: 2013/0089,678
PLASMA-ENHANCED DEPOSITION OF NICKEL-CONTAINING FILMS FOR VARIOUS APPLICATIONS USING AMIDINATE NICKEL PRECURSORS
Abstract
The disclosure relates to a process for depositing a Nickel or Cobalt containing film comprising the step of providing a metal guanidinate and/or metal amidinate precursor, suitable for plasma deposition at temperature equal or lower than 500 degrees C., to a plasma deposition process comprising a deposition temperature equal or lower than 500 degrees C.
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