Substrate imprinted with a pattern for forming isolated device regions
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United States of America Patent
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Apr 16, 2019
Grant Date -
Jan 18, 2018
app pub date -
Sep 28, 2017
filing date -
Mar 29, 2013
priority date (Note) -
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Abstract
An example provides a method for forming an apparatus including a substrate imprinted with a pattern for forming isolated device regions. A method may include imprinting an unpatterned area of a substrate with a pattern to form a patterned substrate having a plurality of recessed regions at a first level and a plurality of elevated regions at a second level, and depositing a first layer of conductive material over the patterned substrate with a plurality of breaks to form a plurality of bottom electrodes. The method may include depositing a layer of an active stack, with a second layer of conductive material, over the plurality of bottom electrodes to form a plurality of devices on the plurality of recessed regions isolated from each other by the plurality of elevated regions.
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