NON-VOLATILE MEMORY DEVICE AND METHOD OF FABRICATING THE SAME

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United States of America Patent

APP PUB NO 20180019134A1
SERIAL NO

15647692

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Abstract

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Provided are a non-volatile memory device and a method of fabricating the same. The non-volatile memory includes a channel layer, a data storage layer disposed on the channel layer, a plurality of control gates arranged on the data storage layer and spaced apart from one another, and conductive cover layers disposed on sidewalls of the control gates facing each other. The plurality of control gates includes a first conductor having a first work function. The conductive cover layers include a second conductor having a second work function that is greater than the first work function.

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Patent Owner(s)

Patent OwnerAddress
SK HYNIX INCGYEONGGI DO SOUTH KOREA GYEONGGI-DO
SOGANG UNIVERSITY RESEARCH FOUNDATION35 BAEKBEOM-RO MAPO-GU SEOUL 04107

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHOI, Woo Young Seoul, KR 79 571

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