Charged particle beam device, and method of manufacturing component for charged particle beam device

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United States of America Patent

PATENT NO 10170273
APP PUB NO 20180019096A1
SERIAL NO

15544958

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Abstract

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The purpose of the present invention is to provide a charged particle beam device that exhibits high performance due to the use of vanadium glass coatings, and to provide a method of manufacturing a component for a charged particle beam device. Specifically provided is a charged particle beam device using a vacuum component characterized by comprising a metal container, the interior space of which is evacuated to form a high vacuum, and coating layers formed on the surface on the interior space-side of the metal container, wherein the coating layers are vanadium-containing glass, which is to say an amorphous substance. Coating vanadium glass onto walls of a space where it is desirable to form a high vacuum, for example walls in the vicinity of an electron source, reduces gas discharge in the vicinity of the electron source, and the getter effect of the coating layer induces localized evacuation and enables the formation of an extremely high vacuum, even in spaces having a complex structure, without providing a large high-vacuum pump.

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Patent Owner(s)

Patent OwnerAddress
HITACHI HIGH-TECH CORPORATION17-1 TORANOMON 1-CHOME MINATO-KU TOKYO 105-6409

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Aoyagi, Takuya Tokyo, JP 70 418
Fujieda, Tadashi Tokyo, JP 59 568
Ichimura, Takashi Tokyo, JP 30 198
Ito, Hiroyuki Tokyo, JP 540 5295
Kato, Shinichi Tokyo, JP 342 5182
Miyake, Tatsuya Tokyo, JP 48 106
Murakoshi, Hisaya Tokyo, JP 39 462
Naitou, Takashi Tokyo, JP 45 515
Tanimoto, Kenji Tokyo, JP 77 873

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