Method and Apparatus for Design of a Metrology Target
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United States of America Patent
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Jan 18, 2018
app pub date -
Jul 14, 2017
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Jul 15, 2016
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Abstract
A method and apparatus are described for providing an accurate and robust measurement of a lithographic characteristic or metrology parameter. The method includes providing a range or a plurality of values for each of a plurality of metrology parameters of a metrology target, providing a constraint for each of the plurality of metrology parameters, and calculating, by a processor to optimize/modify these parameters within the range of the plurality of values, resulting in a plurality of metrology target designs having metrology parameters meeting the constraints.
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