Lithographic apparatus and device manufacturing method
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Feb 19, 2019
Grant Date -
Jan 18, 2018
app pub date -
Jan 26, 2016
filing date -
Mar 3, 2015
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A lithographic apparatus comprising: a positioning stage (WT); an isolation frame (300); a projection system (PS), comprising a first frame (210); a second frame (220); a supporting frame (10) for supporting the positioning stage; a first vibration isolation system (250) and a second vibration isolation system (270), wherein the supporting frame and the first frame are coupled via the first vibration isolation system; a stage position measurement system (400) to determine directly the position of a stage reference of an element of the positioning stage in one or more degrees of freedom with respect to an isolation frame reference of an element of the isolation frame; and wherein the first frame and the isolation frame are coupled via the second vibration isolation system.
First Claim
Other Claims data not available
Family
International Classification(s)
- 2016 Application Filing Year
- G03F Class
- 1979 Applications Filed
- 1508 Patents Issued To-Date
- 76.21 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 2 Citation Count
- G03F Class
- 39.69 % this patent is cited more than
- 6 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Aug 19, 2026 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Aug 19, 2030 |
