Pattern forming method, photo mask manufacturing method, and electronic device manufacturing method
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United States of America Patent
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Nov 26, 2019
Grant Date -
Jan 18, 2018
app pub date -
Sep 28, 2017
filing date -
Mar 31, 2015
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Abstract
A pattern forming method including a step of coating a substrate with an actinic ray-sensitive or radiation-sensitive resin composition and forming an actinic ray-sensitive or radiation-sensitive film; a step of simultaneously irradiating the actinic ray-sensitive or radiation-sensitive film with a plurality of electron beams; and a step of developing the actinic ray-sensitive or radiation-sensitive film after the irradiation with electron beams is provided. The composition contains a resin (A), a photoacid generator (B), and an acid diffusion control agent (C) and a molar ratio (Qp) between the photoacid generator (B) and the acid diffusion control agent (C), which is represented by Equation (1) is 0.3 or greater.
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