PHOTOCURABLE COMPOSITION FOR IMPRINT, METHOD OF PRODUCING CURED FILM, METHOD OF PRODUCING OPTICAL COMPONENT, METHOD OF PRODUCING CIRCUIT BOARD, AND METHOD OF PRODUCING ELECTRONIC COMPONENT
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United States of America Patent
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Dec 15, 2015
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Dec 19, 2014
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Abstract
The present invention relates to a photocurable composition for imprint in a condensable gas atmosphere. The composition at least includes a polymerizable compound component (A) and photopolymerization initiator component (B) and satisfies the Requirement (1):
- a value ECG of greater than or equal to 2.30 GPa,where ECG denotes the reduced modulus (GPa) of a photocured film prepared by exposing the photocurable composition for imprint to light at an exposure dose of 200 mJ/cm' in an atmosphere containing a condensable gas in a concentration of 90% by volume or more.
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