Method and apparatus for precleaning a substrate surface prior to epitaxial growth

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United States of America Patent

PATENT NO 10428441
APP PUB NO 20180016705A1
SERIAL NO

15627149

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Abstract

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Embodiments of the present invention generally relate to methods for removing contaminants and native oxides from substrate surfaces. The methods generally include removing contaminants disposed on the substrate surface using a plasma process, and then cleaning the substrate surface by use of a remote plasma assisted dry etch process.

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Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS INC3050 BOWERS AVENUE SANTA CLARA CA 95054

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chopra, Saurabh Santa Clara, US 39 1142
Guarini, Theresa K San Jose, US 4 19
Hawrylchak, Lara Gilroy, US 81 544
Lo, Chi Wei San Jose, US 5 19
Olsen, Christopher S Fremont, US 103 3920
Stone, Peter Los Gatos, US 40 368
Tobin, Jeffrey Mountain View, US 29 947

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