Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates

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United States of America Patent

PATENT NO 10738219
APP PUB NO 20180016468A1
SERIAL NO

15538313

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Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and/or co-balt alloy comprising substrates Abstract Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) comprising (i) cobalt and/or (ii) a cobalt alloy, wherein the CMP composition (Q) comprises (A) Inorganic particles (B) a substituted tetrazole derivative of the general formula (I), wherein R1 is H, hydroxy, alkyl, aryl, alkylaryl, amino, carboxyl, alkylcarboxyl, thio or alkylthio. (C) at least one amino acid (D) at least one oxidizer, (E) an aqueous medium and wherein the CMP composition (Q) has a pH of from 7 to 10.

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BASF SECARL-BOSCH-STRASSE 38 LUDWIGSHAFEN AM RHEIN 67056

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Golzarian, Reza M Portland, US 20 56
Guevenc, Haci Osman Heidelberg, DE 20 32
Lan, Yongqing Ludwigshafen, DE 22 83
Lauter, Michael Mannheim, DE 35 113
Leunissen, Leonardus Ludwigshafen, DE 19 53
Proelss, Julian Worms, DE 24 54
Reichardt, Robert Ludwigshafen am Rhein, DE 15 40
Siebert, Max Ludwigshafen, DE 23 46
Usman, Ibrahim Sheik Ansar Heverlee, BE 13 74

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