METHOD FOR PREPARING NANO-PATTERN, AND NANO-PATTERN PREPARED THEREFROM
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United States of America Patent
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app pub date -
Jun 2, 2017
filing date -
Dec 3, 2014
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
Provided are a method for manufacturing a nano-pattern including: increasing a temperature of a self-assembling material applied on a substrate through light irradiation to form a self-assembly pattern, and a nano-pattern manufactured thereby. More particularly, the present invention relates to a method for manufacturing a nano-pattern capable of implementing various circuit patterns through simple dragging without using a photoresist pattern or chemical pattern in advance, implementing the nano-pattern on a substrate having a three-dimensional structure such as a flexible substrate as well as a flat substrate, and performing a process without a specific environmental restriction. In addition, the present invention relates to a method for manufacturing a nano-pattern capable of forming a large-area self-assembly pattern within a very short time, that is, several to several ten milliseconds (ms) by instantly irradiating high-energy flash light to instantly perform thermal annealing.
First Claim
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