RESIN COMPOSITION AND MULTILAYER STRUCTURE USING SAME

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United States of America Patent

SERIAL NO

15711371

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Abstract

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A resin composition which can suppress the deterioration of performances of a multilayer structure due to moisture absorption regardless that the multilayer structure includes a hygroscopic layer whose performance is deteriorated due to moisture absorption, and a multilayer structure including a layer of the resin composition, are provided. Since the resin composition contains a hydrate-forming alkaline earth metal salt having a specific water absorption property, a multilayer structure comprising a layer of the resin composition can exhibit moisture resistance as a whole of the multilayer structure without affecting the appearance thereof.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI CHEMICAL CORPORATION1-1 MARUNOUCHI 1-CHOME CHIYODA-KU TOKYO 1008251 ?1008251

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KANI, Shouichi Osaka, JP 12 59

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