Semiconductor Devices and Methods for Forming Semiconductor Devices

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United States of America Patent

SERIAL NO

15642893

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Abstract

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A semiconductor device includes an anode doping region of a diode structure arranged in a semiconductor substrate. The anode doping region has a first conductivity type. The semiconductor device further includes a second conductivity type contact doping region having a second conductivity type. The second conductivity type contact doping region is arranged at a surface of the semiconductor substrate and surrounded in the semiconductor substrate by the anode doping region. The anode doping region includes a buried non-depletable portion. At least part of the buried non-depletable portion is located below the second conductivity type contact doping region in the semiconductor substrate.

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Patent Owner(s)

Patent OwnerAddress
INFINEON TECHNOLOGIES AG85579 NEUBIBERG

International Classification(s)

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  • 2017 Application Filing Year
  • H01L Class
  • 30754 Applications Filed
  • 25260 Patents Issued To-Date
  • 82.14 % Issued To-Date

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mauder, Anton Kolbermoor, DE 350 3377
Pfirsch, Frank Dieter Munich, DE 47 215
Schulze, Hans-Joachim Taufkirchen, DE 693 4306
Seng, Philipp Munich, DE 11 44
Willmeroth, Armin Friedberg, DE 138 1429

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges3689997611243481558461392216162801 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +05001000150020002500300035004000450050005500600065007000750080008500900095001000010500

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