Electrostatic chuck with features for preventing electrical arcing and light-up and improving process uniformity

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United States of America Patent

PATENT NO 11069553
APP PUB NO 20180012785A1
SERIAL NO

15634365

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Importance

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Abstract

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A substrate support for a substrate processing system includes a baseplate, a bond layer provided on the baseplate, and a ceramic layer arranged on the bond layer. The ceramic layer includes a first region and a second region located radially outward of the first region, the first region has a first thickness, the second region has a second thickness, and the first thickness is greater than the second thickness.

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Patent Owner(s)

Patent OwnerAddress
LAM RESEARCH CORPORATION4650 CUSHING PARKWAY FREMONT CA 94538

International Classification(s)

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  • 2017 Application Filing Year
  • H01L Class
  • 30754 Applications Filed
  • 25260 Patents Issued To-Date
  • 82.14 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances2017201820192020202120222023202420250255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Zhigang Campbell, US 140 2728
Gaff, Keith Fremont, US 29 1478
Holland, John Patrick San Jose, US 50 1772
Kozakevich, Felix Sunnyvale, US 46 1193
Marakhtanov, Alexei Albany, US 125 2117
Matyushkin, Alexander San Jose, US 40 1470
Singh, Harmeet Fremont, US 164 5886

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Patent Citation Ranking

  • 1 Citation Count
  • H01L Class
  • 52.76 % this patent is cited more than
  • 4 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges1445612453334991910216201 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 80010002000300040005000600070008000900010000110001200013000140001500016000

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