Substrate liquid processing apparatus, substrate liquid processing method and storage medium

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United States of America Patent

PATENT NO 10096497
APP PUB NO 20180012777A1
SERIAL NO

15636069

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Abstract

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A substrate liquid processing apparatus includes a liquid processing unit configured to process a substrate by a processing liquid, and a controller. The controller processes the substrate in the liquid processing unit, and switches the processing liquid discharged from a discharge line, from a recycling line, to a waste line in which the processing liquid is discarded through the discharge line to the outside, according to a concentration of an elution component eluted from the substrate.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sato, Hideaki Kumamoto, JP 206 3212

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