Method of forming later insulating films for MTJ

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United States of America Patent

PATENT NO 10910215
APP PUB NO 20180012756A1
SERIAL NO

15639682

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Abstract

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There is provided a method of forming an insulating film which includes providing a workpiece having a base portion and a protuberance portion formed to protrude from the base portion; and forming an insulating film on the workpiece by sputtering. The forming an insulating film includes forming the insulating film while changing an angle defined between the workpiece and a target.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDTOKYO

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Furukawa, Shinji Nirasaki, JP 47 290
Hatano, Tatsuo Nirasaki, JP 76 1649
Suzuki, Naoyuki Nirasaki, JP 63 524
Watanabe, Naoki Nirasaki, JP 375 4361

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