MEASURING METHOD, STAGE APPARATUS, AND EXPOSURE APPARATUS
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United States of America Patent
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N/A
Issued Date -
N/A
app pub date -
Sep 20, 2017
filing date -
Jul 18, 2007
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
An exposure apparatus exposes a substrate with an illumination light via a projection optical system. The apparatus has a base member supported via a first isolating member below the projection optical system; a stage arranged on the base member, and having a holder configured to support the substrate; a metrology frame supported via a second isolating member; a drive system to drive the stage on the base member; a plurality of grating portions on the metrology frame and arranged substantially parallel to a predetermined plane orthogonal to an optical axis of the projection optical system above the stage; an encoder system on the stage and configured to obtain position information of the stage; and a controller configured to control the drive system based on the position information obtained by the encoder system.
First Claim
Other Claims data not available