Resist underlayer film composition, patterning process, method for forming resist underlayer film, and compound for resist underlayer film composition

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United States of America Patent

PATENT NO 10620537
APP PUB NO 20180011405A1
SERIAL NO

15621482

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A resist underlayer film composition for use in a multilayer resist method, containing one or more compounds shown by formula (1), and an organic solvent,

description='In-line Formulae' end='lead'WX)n  (1)description='In-line Formulae' end='tail'

W represents an n-valent organic group having 2 to 50 carbon atoms. X represents a monovalent organic group shown by formula (1X). “n” represents an integer of 1 to 10,

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Patent Owner(s)

Patent OwnerAddress
SHIN-ETSU CHEMICAL CO LTDTOKYO TOKYO METROPOLIS

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Biyajima, Yusuke Jyoetsu, JP 32 121
Kikuchi, Rie Jyoetsu, JP 12 106
Kori, Daisuke Jyoetsu, JP 142 782
Ogihara, Tsutomu Jyoetsu, JP 204 2124
Watanabe, Takeru Jyoetsu, JP 213 2730

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