Method and apparatus for reticle optimization
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United States of America Patent
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Jul 28, 2020
Grant Date -
Jan 11, 2018
app pub date -
Jan 20, 2016
filing date -
Feb 12, 2015
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Abstract
A method includes determining topographic information of a substrate for use in a lithographic imaging system, determining or estimating, based on the topographic information, imaging error information for a plurality of points in an image field of the lithographic imaging system, adapting a design for a patterning device based on the imaging error information. In an embodiment, a plurality of locations for metrology targets is optimized based on imaging error information for a plurality of points in an image field of a lithographic imaging system, wherein the optimizing involves minimizing a cost function that describes the imaging error information. In an embodiment, locations are weighted based on differences in imaging requirements across the image field.
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