Array substrate and manufacture method thereof
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United States of America Patent
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Feb 13, 2018
Issued Date -
N/A
app pub date -
Sep 25, 2017
filing date -
Dec 1, 2014
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A method for manufacturing an array substrate is provided. The array substrate, by providing a black matrix and a color resist layer on the array substrate and providing the color resist layer on the TFT layer, prevents bad influences on the color resist layer caused by a high temperature TFT process so as to provide a liquid crystal panel with improved displaying quality. The method includes, firstly, forming a black matrix on a substrate, and secondly, implementing a TFT manufacture process on the black matrix, and then forming a color resist layer after the TFT manufacture process. Accordingly, forming both the black matrix and the color resist layer on the array substrate can be achieved, where the color resist layer is formed after the TFT manufacture process to prevent bad phenomenon caused by the high temperature of the TFT process.
First Claim
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Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
---|---|---|
SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTD | NO 9-2 TANGMING RD GUANGMING NEW DISTRICT SHENZHEN GUANGDONG 518132 |
International Classification(s)

- 2017 Application Filing Year
- H01L Class
- 30754 Applications Filed
- 25260 Patents Issued To-Date
- 82.14 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Song, Liwang | Guangdong, CN | 13 | 14 |
# of filed Patents : 13 Total Citations : 14 |
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- H01L Class
- 0 % this patent is cited more than
- 7 Age
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