ANTIREFLECTION FILM AND METHOD OF PRODUCING THE SAME

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United States of America Patent

SERIAL NO

15700382

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Abstract

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An antireflection film substrate that is provided on a surface of a substrate includes a surface layer having an alumina hydrate as a main component. The surface layer has an uneven structure in which a volume proportion of the alumina hydrate per unit volume decreases in a direction from the substrate side to a surface side, and a period of apexes distributed on the uneven structure on the surface side is configured to be equal to or less than a wavelength of light of which reflection is to be suppressed.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM CORPORATION26-30 NISHIAZABU 2-CHOME MINATO-KU TOKYO 106-8620

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
TAKAHASHI, Hiroki Saitama-shi, JP 515 2787

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  • 1 Citation Count
  • B32B Class
  • 39.34 % this patent is cited more than
  • 7 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges2157301922453151102201 - 1011 - 2021 - 3031 - 4041 - 5061 - 7081 - 90100 +0200400600800100012001400160018002000220024002600280030003200

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