METAL ION DETECTION METHOD, TEST SUBSTANCE DETECTION METHOD

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United States of America Patent

SERIAL NO

15652500

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Abstract

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Provided is a method for detecting a test substance. In this method, metal is deposited or a complex containing a test substance and a metal particle is immobilized on a working electrode on an electrode substrate including the working electrode and a counter electrode. An oxidation potential is applied to the working electrode to generate metal ions, then a reduction potential is applied to a portion having an area smaller than an area of the portion to which an oxidation potential is applied in the working electrode to deposit metal on the surface of the portion to which the reduction potential is applied, and current, voltage or charge caused by the metal deposited is measured to detect metal ions or a test substance.

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Patent Owner(s)

Patent OwnerAddress
SYSMEX CORPORATION5-1 WAKINOHAMA-KAIGANDORI 1-CHOME CHUO-KU KOBE-SHI HYOGO 651-0073

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHIKAE, Miyuki Nomi-shi, JP 3 4
HORI, Nobuyasu Nishinomiya, JP 19 65
KIRIMURA, Hiroya Ashiya-si, JP 27 702
TAKAMURA, Yuzuru Nomi-shi, JP 12 45

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