Optical measurement element for alignment in wafer-level testing and method for aligning an optical probe using the same

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United States of America Patent

PATENT NO 10088299
APP PUB NO 20180010906A1
SERIAL NO

15641384

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Abstract

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An alignment optical measurement element includes a grating coupler, and a reflector coupled to the grating coupler. The alignment optical measurement element is arranged so that: the grating coupler diffracts an incident light in a first direction into a first diffracted light to propagate the first diffracted light as a first propagating light in a second direction, the reflector reflects the first propagating light into a second propagating light in a third direction opposite to the second direction; and the grating coupler diffracts the second propagating light into a second diffracted light to emit the second diffracted light as an emitted light in a fourth direction opposite to the first direction.

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Patent Owner(s)

Patent OwnerAddress
NEC CORPORATION7-1 SHIBA 5-CHOME MINATO-KU TOKYO 108-8001
PHOTONICS ELECTRONICS TECHNOLOGY RESEARCH ASSOCIATION20-10 SEKIGUCHI 1-CHOME BUNKYO-KU TOKYO 112-0014

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Tokushima, Masatoshi Tokyo, JP 31 469

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