COMPOSITION FOR FORMING EASY-TO-DETACH THIN RESIN FILM, AND EASY-TO-DETACH THIN RESIN FILM

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United States of America Patent

SERIAL NO

15546608

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Abstract

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The invention provides a composition for forming an easy-to-detach thin resin film, the composition being characterized by including a urethane (meth)acrylate compound, and a first polymerizable composition containing an ethylenic unsaturated monomer having a tert-butoxy group and a radical polymerization initiator, or a polymer of a second polymerizable composition containing the ethylenic unsaturated monomer having a tert-butoxy group, wherein the amount of the ethylenic unsaturated monomer having a tert-butoxy group is 5 mass % or more and less than 95 mass % with respect to the sum of the amount of the urethane (meth)acrylate compound and the total amount of the monomer(s) contained in the first polymerizable composition or the second polymerizable composition.

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Patent Owner(s)

Patent OwnerAddress
NISSAN CHEMICAL INDUSTRIES LTDTOKYO JAPAN TOKYO METROPOLIS

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
SATO, Tetsuo Funabashi-shi, JP 95 662

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