Deposition mask and manufacturing method
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United States of America Patent
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Aug 20, 2019
Grant Date -
Jan 11, 2018
app pub date -
Jan 19, 2016
filing date -
Jan 20, 2015
priority date (Note) -
In Force
status (Latency Note)
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Abstract
It comprises: a film made of a resin in which an aperture pattern is formed, the aperture pattern passing through the film, the aperture being with a shape and dimension corresponding to the thin-film pattern in a pre-established region for formation of the thin-film pattern on the substrate; and a metal member that has an aperture part opposite the aperture pattern with a shape and dimension larger than the aperture pattern, the metal member being provided as a thin sheet in intimate contact with one surface of the film on an outside part of the aperture pattern of the film. The film is mutually distanced and distributed, at a position where the film does not overlap the aperture pattern, into a plurality of divided parts on one surface of the metal member.
First Claim
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International Classification(s)
- C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....
- H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
- B29C:SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTAN....
- B05B:SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B23K:SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLA....
- B29K:INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, ....
- B29L:INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RE....
- B32B:LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA....
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