METHODS FOR THE VAPOR PHASE DEPOSITION OF POLYMER THIN FILMS

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United States of America Patent

SERIAL NO

15547135

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Abstract

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Disclosed are methods for forming thin polymeric films on a surface of an article by deposition from the vapor phase. In certain embodiments, the method comprises depositing the polymeric film in situ inside a space or enclosure contained within the article. In other embodiments, the method comprises depositing a film from vapor phase by thermal degradation of an initiator precursor without the need for an external filament.

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Patent Owner(s)

Patent OwnerAddress
MASSACHUSETTS INSTITUTE OF TECHNOLOGY77 MASSACHUSETTS AVENUE CAMBRIDGE MA 02139

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Borrelli, David C Cambridge, US 3 5
Gleason, Karen K Cambridge, US 72 1285
Paxson, Adam T Cambridge, US 30 527
Varanasi, Kripa K Lexington, US 90 1015

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