Chamber device, target generation method, and extreme ultraviolet light generation system
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United States of America Patent
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Jul 17, 2018
Grant Date -
Jan 4, 2018
app pub date -
Sep 7, 2017
filing date -
Apr 28, 2015
priority date (Note) -
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Abstract
A chamber device may include a chamber, and a target generation device assembled into the chamber and configured to supply a target material into the chamber, the target generation device including a tank configured to store the target material, a temperature variable device configured to vary temperature of the target material in the tank, and a nozzle section in which a nozzle hole configured to output the target material in a liquid form is formed, and the chamber device may further include a gas nozzle having an inlet port facing the nozzle section and configured to introduce gas into the chamber, a gas supply source configured to supply gas containing hydrogen to the gas nozzle to supply the gas containing the hydrogen to at least periphery of the nozzle section, and a moisture remover configured to remove moisture at least in the periphery of the nozzle section in the chamber.
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