Systems and methods for tailoring ion energy distribution function by odd harmonic mixing
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United States of America Patent
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Jul 17, 2018
Grant Date -
Jan 4, 2018
app pub date -
Jul 1, 2016
filing date -
Jul 1, 2016
priority date (Note) -
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Abstract
Systems and methods for controlling a process applied to a substrate within a plasma chamber are described. The systems and methods include generating and supplying odd harmonic signals and summing the odd harmonic signals to generate an added signal. The added signal is supplied to an electrode within the plasma chamber for processing the substrate. The use of odd harmonic signals facilitates high aspect ratio etching of the substrate.
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